Defining Gloss and Retrace PCB Editor Preferences for Altium NEXUS

Applies to NEXUS Client versions: 4 and 5

This documentation page references Altium NEXUS/NEXUS Client (part of the deployed NEXUS solution), which has been discontinued. All your PCB design, data management and collaboration needs can now be delivered by Altium Designer and a connected Altium 365 Workspace. Check out the FAQs page for more information.

 

Parent page: Accessing, Defining & Managing System Preferences

The PCB Editor – Gloss And Retrace page of the Preferences dialog
The PCB Editor – Gloss And Retrace page of the Preferences dialog

Summary

The PCB Editor – Gloss And Retrace page of the Preferences dialog provides numerous controls relating to the functionality of the Gloss Selected and Retrace Selected features within the PCB design space.

Access

The page can be accessed when the PCB.Routing.GlossRetracePanel option is enabled in the Advanced Settings dialog.

This page is part of the main Preferences dialog that is accessed by clicking the control in the upper-right corner of the design space then selecting the General entry under the PCB Editor folder.

Options/Controls

Gloss & Retrace Parameters

  • Hugging Style – controls how corner shapes are to be managed during glossing or retracing.

    • 45 Degree – always use straight orthogonal/diagonal segments to create corners during glossing or retracing (use this mode for traditional orthogonal/diagonal routing behavior).
    • Rounded – use arcs at each vertex involved in the glossing or retracing. Use this mode to use arcs + any angle routes when glossing.
  • Avoid polygons – when this option is enabled, existing polygons will be respected when the Gloss Selected or Retrace Selected command is run. If the option is disabled existing polygons will be ignored (routed across), affected polygons can then be repoured.
  • Avoid rooms – when this option is enabled, existing rooms will be respected when the Gloss Selected or Retrace Selected command is run. If a room scoped by specific routing width requirements is defined in the design and the routing to be glossed/retraced does not cross the room, the resulting routing will not cross this room either when the option is enabled. If the option is disabled, existing rooms will be routed across, and the width to be used within such rooms will be that is defined in constraints of the room-based rule.
  • Pad Entry Stability – enter the desired level of protection for centered pad entries. The higher the number, the greater protection; '0' gives no protection; '10' gives maximum protection.
  • Miter Ratio – controls the minimum corner tightness. The Miter Ratio multiplied by the current track width equals the separation between walls of the tightest U-shape that can be routed for that ratio. Enter a positive value equal to or greater than zero.

Gloss Parameters

  • Effort – select the desired gloss level from the following choices:

    • Weak – in this mode, a low level of glossing is applied. This mode of glossing is typically useful for fine-tuning track layout or when dealing with critical traces.
    • Strong – in this mode, a high level of glossing is applied, with a strong emphasis on the shortest path. This mode of glossing is typically useful in the early stages of the layout process when the aim is to get a good amount of the board routed quickly.

Retrace Parameters

  • Set Width – use the drop-down to select one of the rule-based width options (Min / Max / Preferred) of an applicable Width or Differential Pairs Routing design rule when the Retrace Selected command is run, or select the Current width of tracks to be retraced. Alternatively, enter a desired custom width value directly in the field.
  • Set Diff Pair Gap – use the drop-down to select one of the rule-based gap options (Min / Max / Preferred) of an applicable Differential Pairs Routing design rule when the Retrace Selected command is run, or select the Current gap between differential pair tracks to be retraced. Alternatively, enter a desired custom gap value directly in the field.
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